REG Metals supplies Chromium Oxide Sputtering Targets (Cr₂O₃ Sputtering Targets) for thin film deposition, semiconductor manufacturing, optical coatings, decorative coatings, solar energy, display technology, and advanced research applications. Chromium Oxide (Cr₂O₃) is a high-performance ceramic material known for its excellent chemical stability, high hardness, corrosion resistance, wear resistance, and outstanding optical and dielectric properties.
Chromium Oxide Sputtering Targets are widely used in physical vapor deposition (PVD) and magnetron sputtering systems to produce high-quality chromium oxide thin films. These coatings provide exceptional hardness, oxidation resistance, chemical durability, and optical performance, making them ideal for electronics, optics, sensors, protective coatings, and advanced functional films.
REG Metals supplies high-purity Chromium Oxide Sputtering Targets in various diameters, thicknesses, backing plate configurations, and purity levels. Custom target sizes and bonded assemblies are available for OEM manufacturers, semiconductor fabs, universities, and research laboratories. Every target can be supplied with a Certificate of Analysis (COA) and complete material traceability.
