REG Metals supplies Iridium Oxide Sputtering Targets (IrO₂ Targets) for advanced thin-film deposition, electrochemical applications, semiconductor research, sensors, microelectronics, energy storage, and corrosion-resistant coating applications. Iridium Oxide (IrO₂) is a highly stable conductive oxide material known for its excellent electrical conductivity, outstanding chemical stability, high corrosion resistance, and superior electrochemical performance.
Iridium Oxide Sputtering Targets are commonly used in RF sputtering, magnetron sputtering, and reactive thin-film deposition processes to produce durable oxide coatings on substrates including silicon wafers, glass, metals, and ceramic materials.
IrO₂ thin films are widely researched and utilized for electrodes, electrochemical sensors, oxygen evolution reaction (OER) catalysts, neural interfaces, ferroelectric devices, and protective coatings due to their combination of metallic-like conductivity and oxide stability.
REG Metals supplies high-purity Iridium Oxide sputtering targets with controlled composition, density, purity, and dimensional accuracy for research institutions, semiconductor manufacturers, energy technology companies, and advanced material developers. Custom sizes, bonding options, and specifications are available with Certificate of Analysis (COA) and full material traceability.
