Iridium Sputtering Targets are premium-grade precious metal deposition materials used in Physical Vapor Deposition (PVD), magnetron sputtering, thin-film coating, semiconductor manufacturing, optical coating, aerospace electronics, and advanced research applications. Manufactured from high-purity iridium metal, these sputtering targets provide exceptional thermal stability, corrosion resistance, electrical conductivity, and film uniformity.
Iridium is one of the most corrosion-resistant and temperature-resistant metals available, making it an ideal target material for demanding thin-film deposition processes. Iridium coatings exhibit excellent durability, oxidation resistance, chemical inertness, and electrical performance, making them valuable in semiconductor devices, MEMS components, electrodes, sensors, optical systems, and specialized industrial coatings.
Our Iridium Sputtering Targets are manufactured using advanced powder metallurgy and precision machining techniques to ensure high density, low impurity levels, excellent grain structure, and superior sputtering performance.
Iridium Sputtering Target
- Ultra-high purity iridium material
- Excellent sputtering efficiency
- Superior thin-film uniformity
- Exceptional corrosion and oxidation resistance
- Extremely high melting point (~2446°C)
- High-density target structure
- Excellent adhesion characteristics
- Stable deposition performance
- Low contamination levels
- Suitable for DC, RF, and magnetron sputtering
- Long target service life
- Custom dimensions and bonding options available
