Molybdenum Disulfide Sputtering Target

• High-purity composition: Options from 99.9% to 99.999% may be available.

• Layered crystal structure: Suitable for research involving two-dimensional materials and thin films.

• Functional film properties: Supports development of semiconducting and tribological coatings.

• RF sputtering compatibility: Commonly used with RF sputtering systems.

• Custom dimensions: Disc, rectangular, and other geometries may be available.

• Bonding options: Copper backing plates and bonding services may be sourced according to system requirements.

Property	Typical Specification
Product Name	Molybdenum Disulfide Sputtering Target
Chemical Name	Molybdenum(IV) Sulfide
Chemical Formula	MoS₂
CAS Number	1317-33-5
Molecular Weight	160.07 g/mol
Appearance	Black to dark-gray solid
Crystal Structure	Hexagonal, layered
Density	Approximately 4.8–5.06 g/cm³
Melting Point	Commonly reported around 1,185°C; verify grade-specific data
Purity	99.9%, 99.95%, 99.99%, or higher, subject to availability
Target Geometry	Circular, rectangular, plate, stepped, or custom
Dimensions	Custom diameter, length, width, and thickness
Sputtering Method	RF sputtering is commonly used; process compatibility should be confirmed
Bonding Options	Unbonded or bonded to a compatible backing plate
Applications	Semiconductor research, 2D materials, optoelectronics, thin-film coatings, tribology

• Standard Purity Grade: For general thin-film deposition and laboratory research.

• High-Purity Grade: 99.9% or 99.99% options may be available for electronic and materials research.

• Ultra-High-Purity Grade: 99.999% may be available for specialized applications, subject to sourcing.

• Custom-Dimension Target: Manufactured or sourced to customer drawings and dimensional tolerances.

• Bonded Sputtering Target: Supplied with a compatible backing plate and bonding configuration where available.

• Research-Grade Target: For experimental thin-film deposition, semiconductor studies, and two-dimensional materials development.

1. What is a molybdenum disulfide sputtering target used for?

MoS₂ sputtering targets are used to deposit thin films for semiconductor research, two-dimensional materials, optoelectronics, low-friction coatings, and advanced surface engineering.

2. What is the chemical formula of a molybdenum disulfide sputtering target?

The chemical formula is MoS₂, consisting of one molybdenum atom and two sulfur atoms. Its layered crystal structure is important for its thin-film and electronic properties.

3. What purity levels are available?

Purity options such as 99.9%, 99.95%, 99.99%, and 99.999% may be available depending on the target specification and supplier. Confirm whether the stated purity is based on total material composition or a specific impurity analysis.

4. Which sputtering method is suitable for MoS₂ targets?

RF sputtering is commonly used for MoS₂ targets. The optimal method and operating conditions depend on the equipment, target configuration, and desired film properties.

5. Can molybdenum disulfide sputtering targets be customized?

Yes. Custom sourcing may be available for diameter, thickness, rectangular dimensions, target density, purity, backing plate, and bonding requirements. Provide a drawing or equipment specification when requesting a quote.

6. Can MoS₂ sputtering targets be supplied with a backing plate?

Bonded configurations may be available with copper or another compatible backing plate. The appropriate backing material and bonding method depend on the sputtering system, thermal requirements, and operating conditions.