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REG Metals supplies Osmium Sputtering Targets (Os Targets) for physical vapor deposition (PVD), magnetron sputtering, semiconductor research, electronics, thin-film coatings, sensors, advanced materials, and research applications.

 

Osmium (Os) is a platinum-group metal known for its extremely high density, high melting point, hardness, wear resistance, and chemical stability. Osmium sputtering targets are used as source materials for depositing specialized osmium thin films where high purity and controlled film composition are required.

 

REG Metals supplies high-purity Osmium Sputtering Targets in standard and custom dimensions. Targets are available in round, disc, rectangular, and customer-specific geometries. Bonding to backing plates may also be available depending on target dimensions and sputtering system requirements.

 

Materials can be supplied with Certificate of Analysis (COA), purity documentation, dimensional inspection, and lot traceability.

Osmium Sputtering Target

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