REG Metals supplies Platinum Sputtering Targets (Pt Targets) for physical vapor deposition (PVD), magnetron sputtering, semiconductor fabrication, microelectronics, electrodes, sensors, fuel-cell research, optical coatings, MEMS, and advanced thin-film applications.
Platinum (Pt) is a platinum-group metal valued for its excellent chemical stability, corrosion resistance, high melting point, electrical conductivity, and catalytic activity. These characteristics make platinum an important thin-film material for demanding electronic, electrochemical, semiconductor, and research applications.
Platinum sputtering targets are used to deposit high-purity Pt thin films through sputtering processes. Target quality—including purity, density, grain structure, surface finish, and dimensional accuracy—can influence deposition stability and final film performance.
REG Metals supplies high-purity Platinum Sputtering Targets in round, rectangular, planar, and custom geometries. Backing-plate bonding and precious-metal reclaim options may be available depending on the target configuration and project requirements. Material can be supplied with Certificate of Analysis (COA), purity and impurity data, dimensions, and lot traceability.
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