Potassium Fluoride (KF) Sputtering Target

• High-purity Potassium Fluoride (KF) Sputtering Target
• KF Sputtering Target
• Potassium Fluoride PVD Target
• Potassium Fluoride Thin-Film Target
• High-purity inorganic fluoride
• Controlled potassium and fluorine composition
• Excellent chemical purity
• Low trace-metal impurities
• Suitable for RF sputtering
• Suitable for PVD thin-film deposition
• Suitable for optical coating research
• Suitable for infrared optical materials
• Suitable for semiconductor research
• Suitable for electronic materials
• Suitable for dielectric and insulating films
• Suitable for sensor research
• Suitable for fluoride thin-film development
• Dense target construction available
• Bonded and unbonded targets available
• Copper or molybdenum backing plates available
• Custom target dimensions
• Custom thicknesses
• Custom purity levels
• COA available

Property	Specification
Product Name	Potassium Fluoride Sputtering Target
Chemical Name	Potassium Fluoride
Chemical Formula	KF
CAS Number	7789-23-3
Molecular Weight	58.10 g/mol
Potassium Content	~67.3 wt.%
Fluorine Content	~32.7 wt.%
Purity	99.9%, 99.99%, 99.999%, Custom
Appearance	White / Colorless Solid
Crystal Structure	Cubic
Density	~2.48 g/cm³
Melting Point	~858°C
Sputtering Method	RF / PVD / Custom
Target Shape	Circular / Rectangular / Custom
Diameter	Custom
Length	Custom
Width	Custom
Thickness	Custom
Bonding	Unbonded / Backing Plate Bonded
Backing Plate	Cu / Mo / Custom
Surface Finish	Sputter-Ready / Custom
Packaging	Protective / Vacuum / Custom

• 99.9% Potassium Fluoride Sputtering Target
• 99.99% Potassium Fluoride Sputtering Target
• 99.999% High-Purity KF Sputtering Target
• High-Purity KF Target
• Potassium Fluoride PVD Target
• Potassium Fluoride RF Sputtering Target
• Potassium Fluoride Thin-Film Target
• Optical-Grade KF Sputtering Target
• Infrared-Grade Potassium Fluoride Target
• Semiconductor-Grade KF Target
• Electronics-Grade Potassium Fluoride Target
• Research-Grade KF Target
• Laboratory-Grade Potassium Fluoride Target
• Dense KF Sputtering Target
• Bonded KF Sputtering Target
• Unbonded KF Sputtering Target
• Custom Potassium Fluoride Sputtering Target

1. What is a Potassium Fluoride (KF) Sputtering Target?

A Potassium Fluoride Sputtering Target is a solid KF material used as a source for depositing potassium fluoride-containing thin films and fluoride-based coatings through a physical vapor deposition process.

2. What is Potassium Fluoride Sputtering Target used for?

KF targets can be used for thin-film deposition, optical coatings, infrared materials research, semiconductor research, electronic materials, dielectric films, sensors, and advanced fluoride-material development.

3. Can Potassium Fluoride be used for RF sputtering?

Yes. RF sputtering is suitable for insulating or poorly conducting fluoride target materials such as potassium fluoride.

4. What purity levels are available?

REG Metals can source 99.9%, 99.99%, and 99.999% KF sputtering targets, with customized impurity limits available for specialized applications.

5. What target shapes are available?

Common configurations include round/circular and rectangular KF sputtering targets, with custom shapes available based on the sputtering equipment.

6. Can KF Sputtering Targets be bonded to a backing plate?

Yes. Bonded KF sputtering targets can be supplied with compatible copper, molybdenum, or other backing plates according to the target design and cooling requirements.