1. What is a Potassium Niobate Sputtering Target?
A Potassium Niobate Sputtering Target is a dense ceramic target composed primarily of KNbO₃, used as a source material for depositing potassium niobate thin films through sputtering and other physical vapor deposition techniques.
2. What are KNbO₃ sputtering targets used for?
KNbO₃ targets are used for ferroelectric thin films, piezoelectric devices, optical and photonic materials, nonlinear optics, electro-optic devices, sensors, actuators, and advanced electronic-material research.
3. What sputtering methods can be used with KNbO₃ targets?
Potassium niobate ceramic targets can be used in RF sputtering and magnetron sputtering systems, depending on the target design and deposition equipment. They may also be used in PLD systems when manufactured to the appropriate specification.
4. Can the potassium-to-niobium ratio be controlled?
Yes. The K/Nb stoichiometry can be controlled during target manufacturing. This is particularly important because potassium volatility during deposition can influence the composition of the resulting thin film.
5. Can KNbO₃ targets be bonded to a backing plate?
Yes. Bonded Potassium Niobate sputtering targets can be supplied with compatible copper, molybdenum, or other backing plates. Unbonded targets are also available.
6. Does REG Metals provide a Certificate of Analysis?
Yes. A Certificate of Analysis (COA) can be supplied documenting KNbO₃ purity, K/Nb ratio, density, dimensions, grain structure, trace impurities, and other applicable sputtering-target specifications.
