Praseodymium Nickel Oxide (PrNiO) Sputtering Target is a high-purity rare-earth nickelate ceramic sputtering target designed for PVD thin-film deposition, RF sputtering, oxide electronics, semiconductor research, sensors, resistive switching, memristors, neuromorphic devices, and advanced functional oxide research.
Also known as Praseodymium Nickel Oxide Sputtering Target, PrNiO Sputtering Target, PrNiO₃ Sputtering Target, Praseodymium Nickelate Target, PrNiO₃ PVD Target, and Rare-Earth Nickelate Sputtering Target, this material is used to deposit functional Pr–Ni–O thin films with tunable electrical, optical, and correlated-electron properties.
Important: “PrNiO” is sometimes used as a general designation for praseodymium nickel oxide, while PrNiO₃ (praseodymium nickelate) is the commonly specified stoichiometric rare-earth nickelate. REG Metals can supply the target according to the customer's required Pr:Ni:O stoichiometry and phase specification.
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