Silicon Thermal Oxide Wafer

• High-quality Silicon Thermal Oxide Wafer
• Thermal Oxide Silicon Wafer
• SiO₂/Si Wafer
• Thermally Oxidized Silicon Wafer
• Silicon Dioxide Coated Silicon Wafer
• Thermally grown SiO₂ layer
• High-quality Si/SiO₂ interface
• Excellent oxide uniformity
• Excellent surface quality
• High electrical insulation
• Excellent dielectric properties
• Excellent chemical stability
• High thermal stability
• Excellent adhesion
• Precise oxide thickness control
• Suitable for photolithography
• Suitable for semiconductor fabrication
• Suitable for MEMS fabrication
• Suitable for microelectronics
• Suitable for sensors
• Suitable for photonics
• Suitable for MOS devices
• Suitable for capacitor fabrication
• Suitable for surface passivation
• Suitable for laboratory research
• Prime and research grades available
• Custom oxide thickness
• Custom wafer specifications
• COA available

Property	Specification
Product Name	Silicon Thermal Oxide Wafer
Substrate	Single-Crystal Silicon
Oxide Material	Silicon Dioxide (SiO₂)
Oxide Formation	Thermal Oxidation
Wafer Diameters	2", 3", 4", 6", 8", Custom
Crystal Orientation	(100), (111), Custom
Conductivity Type	P-Type / N-Type
Resistivity	Custom
Wafer Thickness	Custom
Oxide Thickness	~10 nm to several µm, Custom
Oxide Type	Dry / Wet Thermal Oxide
Oxide Uniformity	Custom
Surface	SSP / DSP
Surface Finish	Polished
Grade	Prime / Test / Research
Edge Profile	Standard / Custom
Particle Level	Controlled
Packaging	Cleanroom / Vacuum / Custom

• Thermal Oxide Silicon Wafer
• SiO₂/Si Wafer
• Thermally Oxidized Silicon Wafer
• Silicon Dioxide Coated Silicon Wafer
• Dry Thermal Oxide Wafer
• Wet Thermal Oxide Wafer
• Thin Thermal Oxide Silicon Wafer
• Thick Thermal Oxide Silicon Wafer
• High-Quality Si/SiO₂ Wafer
• Prime-Grade Thermal Oxide Wafer
• Research-Grade Thermal Oxide Wafer
• Test-Grade Thermal Oxide Wafer
• P-Type Silicon Thermal Oxide Wafer
• N-Type Silicon Thermal Oxide Wafer
• (100) Silicon Thermal Oxide Wafer
• (111) Silicon Thermal Oxide Wafer
• Single-Side Polished Thermal Oxide Wafer
• Double-Side Polished Thermal Oxide Wafer
• Semiconductor-Grade SiO₂/Si Wafer
• MEMS-Grade Thermal Oxide Wafer
• Photonics-Grade Thermal Oxide Wafer
• Custom Thermal Oxide Silicon Wafer

1. What is a Silicon Thermal Oxide Wafer?

A Silicon Thermal Oxide Wafer is a silicon substrate with a layer of silicon dioxide (SiO₂) thermally grown directly on the silicon surface.

2. What is thermal oxidation?

Thermal oxidation is a semiconductor manufacturing process in which silicon is heated in an oxidizing environment to form a controlled SiO₂ layer on the silicon wafer surface.

3. What are thermal oxide wafers used for?

They are widely used for semiconductor processing, MOS devices, MEMS, photolithography, sensors, capacitors, microelectronics, photonics, surface passivation, and research.

4. What is the difference between dry and wet thermal oxide?

Dry oxidation generally produces a denser, higher-quality oxide with slower growth, while wet oxidation produces SiO₂ more rapidly and is commonly used when thicker oxide layers are required.

5. What oxide thicknesses are available?

REG Metals can source wafers with thin or thick thermal oxide layers, from approximately 10 nm to several micrometers, depending on the application and required tolerance.

6. What silicon wafer orientations are available?

Common orientations include (100) and (111), with custom orientations available for specialized applications.