REG Metals supplies premium-quality Tantalum Boride (TaB₂) Sputtering Targets for advanced Physical Vapor Deposition (PVD) and thin-film coating applications. Tantalum Boride is an ultra-high temperature ceramic (UHTC) known for its exceptional hardness, high melting point, excellent electrical conductivity, superior wear resistance, and outstanding chemical stability, making it an ideal material for protective coatings, semiconductor research, aerospace components, and advanced electronics.
Our TaB₂ sputtering targets are manufactured from high-purity raw materials using advanced hot pressing and sintering processes to achieve high density, excellent stoichiometry, and consistent sputtering performance. REG Metals supplies standard and custom target dimensions, bonded or unbonded assemblies, and backing plate options for research laboratories, universities, OEMs, and industrial manufacturers.
Every shipment includes a Certificate of Analysis (COA) and complete material traceability.
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