REG Metals supplies Tantalum Silicide (Ta₅Si₃) Sputtering Targets for applications requiring controlled composition, high purity, uniform deposition, and reliable thin-film performance.
Ta₅Si₃ is a refractory tantalum-silicon compound known for its high-temperature stability, electrical conductivity, hardness, and resistance to oxidation and chemical attack. It is used in research and development involving semiconductor materials, conductive thin films, diffusion barriers, microelectronics, and high-temperature protective coatings.
REG Metals can source Ta₅Si₃ targets in various purities, dimensions, thicknesses, bonding configurations, and target geometries, including custom sizes based on customer drawings.
Every shipment includes a Certificate of Analysis (COA) and complete material traceability.
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