REG Metals supplies premium-quality Tungsten Carbide Sputtering Targets (WC Targets) designed for advanced physical vapor deposition (PVD), magnetron sputtering, thin-film coating, and research applications. Tungsten Carbide is a high-performance refractory carbide material known for its extreme hardness, excellent wear resistance, high-temperature stability, chemical durability, and superior mechanical properties.
WC sputtering targets are widely used to produce hard protective coatings, cutting tool coatings, wear-resistant surfaces, semiconductor materials, decorative coatings, and advanced engineering films. Tungsten Carbide thin films provide enhanced hardness, friction reduction, corrosion resistance, and extended component life in demanding environments.
REG Metals supplies high-density Tungsten Carbide sputtering targets in round, rectangular, square, and custom geometries, with optional bonding services to meet specific deposition system requirements.
Every shipment includes a Certificate of Analysis (COA) and complete material traceability.
