REG Metals supplies premium-quality Tungsten Doped Indium Oxide (IWO) Sputtering Targets for thin-film deposition in semiconductor, optoelectronics, display, photovoltaic, and advanced research applications. IWO is a transparent conducting oxide (TCO) that offers high optical transparency, low electrical resistivity, excellent carrier mobility, and superior thermal stability compared to many conventional transparent conductive materials.
Tungsten doping enhances the electrical conductivity and stability of indium oxide, making IWO sputtering targets ideal for depositing transparent conductive films used in OLED displays, LCD panels, touchscreens, thin-film transistors (TFTs), photovoltaic cells, smart windows, optical coatings, and next-generation electronic devices.
REG Metals manufactures and supplies high-density IWO sputering targets in multiple compositions, dimensions, and bonding configurations for RF sputtering, DC sputtering, and magnetron sputtering systems. Every target includes a Certificate of Analysis (COA) and complete material traceability.
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