REG Metals supplies Vanadium Chromium Sputtering Targets (V-Cr Alloy Sputtering Targets) for physical vapor deposition (PVD), magnetron sputtering, thin film coatings, semiconductor manufacturing, optical coatings, aerospace coatings, wear-resistant coatings, and advanced materials research.
Vanadium Chromium (V-Cr) alloy targets combine the properties of vanadium (V) and chromium (Cr) to produce high-performance thin films with excellent hardness, oxidation resistance, thermal stability, electrical properties, and corrosion resistance. V-Cr coatings are investigated and utilized for applications requiring durable protective layers, diffusion barriers, and advanced functional thin films.
REG Metals manufactures high-purity Vanadium Chromium Sputtering Targets with precise alloy composition control, excellent density, uniform microstructure, and superior bonding performance. Targets are available in planar, rotary, bonded, unbonded, and custom geometries with Certificate of Analysis (COA), material certification, and full lot traceability.
