Vanadium Oxide Sputtering Target

High Purity Thin Film Material

• Available in high purity grades.
• Low impurity content for reliable deposition.
• Produces uniform and consistent coatings.

Excellent Sputtering Performance

• High density target structure.
• Stable plasma performance.
• Efficient material utilization.

Advanced Functional Properties

• Strong electrochemical activity.
• Excellent optical switching characteristics.
• Semiconductor oxide performance.

Custom Target Manufacturing

• Custom dimensions available.
• Multiple purity levels.
• Bonded and unbonded configurations.

Wide Deposition Compatibility

• Suitable for RF and magnetron sputtering.
• Compatible with research and production coating systems.
• Supports advanced thin film development.

Property	Specification / Typical Value
Product Name	Vanadium Oxide Sputtering Target
Chemical Formula	V₂O₅
Material Name	Vanadium Pentoxide
CAS Number	1314-62-1
Purity	99.5%, 99.9%, 99.99% (Custom Available)
Appearance	Dark Yellow / Orange Solid
Density	Approx. 3.35 g/cm³ (Bulk Density Dependent)
Crystal Structure	Orthorhombic
Melting Point	Approx. 690°C
Electrical Properties	Semiconductor Material
Target Type	Planar / Rotary
Bonding Options	Indium Bonding, Elastomer Bonding, Custom
Manufacturing Process	Powder Metallurgy / Hot Pressing / Sintering
Shape	Circular, Rectangular, Custom
Certification	COA Available

• High Purity V₂O₅ Sputtering Targets
• Semiconductor Grade Vanadium Oxide Targets
• Research Grade Vanadium Oxide Targets
• Optical Coating Grade V₂O₅ Targets
• Thin Film Deposition Grade Targets
• Custom Composition Targets

Available purities:

• 99.5% V₂O₅
• 99.9% V₂O₅
• 99.99% V₂O₅
• Ultra High Purity Grades (Custom)

1. What is a Vanadium Oxide Sputtering Target?

A Vanadium Oxide Sputtering Target is a high-purity V₂O₅ ceramic target used in sputtering systems to deposit thin vanadium oxide films onto substrates.

2. What is V₂O₅ sputtering target used for?

V₂O₅ sputtering targets are used for semiconductor coatings, optical films, electrochromic devices, lithium-ion battery research, sensors, and advanced oxide thin films.

3. What sputtering methods can be used with V₂O₅ targets?

Vanadium Oxide Targets are compatible with:

• RF Magnetron Sputtering
• DC Sputtering
• Reactive Sputtering
• Thin Film Deposition Systems

4. What purity levels are available?

REG Metals supplies V₂O₅ sputtering targets in 99.5%, 99.9%, and 99.99% purity grades, with higher purity available upon request.

5. Can custom sputtering targets be manufactured?

Yes. REG Metals provides custom Vanadium Oxide Sputtering Targets with customer-specified dimensions, thicknesses, bonding requirements, and packaging.

6. Does REG Metals provide material certification?

Yes. REG Metals provides Certificate of Analysis (COA), purity analysis, chemical composition reports, and full lot traceability.