REG Metals supplies Vanadium Sputtering Targets (V Sputtering Targets / High Purity Vanadium Targets) for PVD (Physical Vapor Deposition), magnetron sputtering, semiconductor fabrication, optical coatings, thin film deposition, solar energy, electronics, aerospace, and advanced materials research.
Vanadium is a refractory transition metal recognized for its high melting point, excellent corrosion resistance, low contamination characteristics, and outstanding thin-film deposition performance. High-purity Vanadium Sputtering Targets are used to produce vanadium thin films, diffusion barrier layers, conductive coatings, wear-resistant coatings, optical coatings, superconducting materials, and semiconductor films.
REG Metals supplies high-density, high-purity Vanadium Sputtering Targets manufactured using vacuum melting, hot isostatic pressing (HIP), and precision machining processes to ensure uniform grain structure, low porosity, and consistent sputtering performance. Custom target sizes, purity levels, bonded backing plates, and Certificate of Analysis (COA) are available.
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