Zirconium Sputtering Target

• High-purity zirconium sputtering targets
• Excellent sputtering performance
• High density and fine grain structure
• Uniform thin-film deposition
• Excellent corrosion resistance
• Superior oxidation resistance
• High melting point
• Low impurity content
• High deposition efficiency
• Excellent thermal conductivity
• Compatible with RF, DC, and magnetron sputtering systems
• Available bonded or unbonded
• Precision machined to customer specifications
• Custom target dimensions available
• Certificate of Analysis (COA) included

Property	Specification
Product Name	Zirconium Sputtering Target
Material	Zirconium (Zr)
Chemical Symbol	Zr
CAS Number	7440-67-7
Purity	99.5%, 99.9%, 99.95%, 99.99%, 99.995%
Density	≥99% Theoretical Density
Crystal Structure	Hexagonal Close-Packed (HCP)
Melting Point	1,855°C
Shape	Disc, Rectangle, Ring, Rotary Tube, Custom
Manufacturing Method	Vacuum Melted, Hot Worked, Precision Machined
Bonding Options	Bonded or Unbonded
Backing Plate Materials	Copper, Molybdenum, Stainless Steel, Titanium, Custom
Surface Finish	Precision Ground
Compatible Deposition Methods	RF, DC, Magnetron Sputtering
Packaging	Vacuum Sealed, Protective Packaging

• 99.5% Zirconium Target
• 99.9% Zirconium Target
• 99.95% Zirconium Target
• 99.99% Zirconium Target
• 99.995% Zirconium Target
• Semiconductor Grade Zirconium
• Optical Coating Grade Zirconium
• Electronic Grade Zirconium
• Research Grade Zirconium
• Bonded Zirconium Targets
• Unbonded Zirconium Targets
• Rotary Zirconium Sputtering Targets
• Custom Precision Zirconium Targets

1. What is a Zirconium Sputtering Target?

A Zirconium Sputtering Target is a high-purity zirconium source material used in Physical Vapor Deposition (PVD) systems to deposit thin zirconium films onto substrates for semiconductor devices, optical coatings, decorative finishes, and advanced industrial applications.

2. What purity levels are available?

REG Metals commonly supplies:

• 99.5%
• 99.9%
• 99.95%
• 99.99%
• 99.995%

Higher purity levels may be available upon request.

3. What sputtering systems are compatible with Zirconium Targets?

Our targets are compatible with:

• DC Magnetron Sputtering
• RF Magnetron Sputtering
• High-Power Impulse Magnetron Sputtering (HiPIMS)
• Reactive Sputtering
• Standard Physical Vapor Deposition (PVD) Systems

4. What target shapes are available?

We manufacture:

• Disc Targets
• Rectangular Targets
• Ring Targets
• Rotary Tube Targets
• Custom Shapes
• Bonded Assemblies

5. What industries use Zirconium Sputtering Targets?

Common industries include:

• Semiconductor Manufacturing
• Optical Coatings
• Electronics
• Aerospace
• Medical Devices
• Solar Energy
• Automotive
• Decorative Coatings
• Research Laboratories
• Universities
• Government Laboratories

6. Can Zirconium Sputtering Targets be used for reactive sputtering?

Yes. Zirconium is commonly used in reactive sputtering with gases such as oxygen or nitrogen to produce high-performance zirconium oxide (ZrO₂) and zirconium nitride (ZrN) thin films for optical, protective, and decorative coatings.