Aluminum Silicon Sputtering Targets

• High-purity Aluminum Silicon (Al/Si) Sputtering Targets
• Al-Si Sputtering Targets
• AlSi Sputtering Targets
• Aluminum-Silicon Alloy Sputtering Targets
• Aluminum Silicon Alloy Targets
• Al/Si Metal Targets
• Controlled silicon concentration
• High chemical purity
• Excellent sputtering stability
• Uniform film deposition
• Consistent alloy composition
• Controlled grain structure
• High target density
• Low impurity content
• Excellent electrical conductivity
• Suitable for DC sputtering
• Suitable for RF sputtering
• Suitable for magnetron sputtering
• Suitable for reactive sputtering
• Suitable for PVD
• Suitable for semiconductor fabrication
• Suitable for microelectronics
• Suitable for photovoltaics
• Suitable for MEMS
• Suitable for display technologies
• Suitable for optical coatings
• Suitable for metallization
• Custom Si concentrations
• Bonded and unbonded options
• Copper and molybdenum backing plates available
• Custom dimensions available
• COA available

Property	Specification
Product Name	Aluminum Silicon Sputtering Target
Common Names	AlSi Target, Al-Si Target, Al/Si Target
Material	Aluminum-Silicon Alloy
Primary Elements	Al + Si
Silicon Content	Custom; commonly 0.5–20 wt.%
Aluminum Content	Balance
Purity	99.5%, 99.9%, 99.95%, 99.99%, Custom
Appearance	Metallic Silver / Gray
Material Type	Metal Alloy
Density	Composition Dependent
Target Shape	Circular / Rectangular / Custom
Diameter	Custom
Length	Custom
Width	Custom
Thickness	Custom
Grain Structure	Fine / Controlled
Target Density	High-Density / Custom
Sputtering Method	DC / RF / Magnetron / Reactive
Bonding	Bonded / Unbonded
Backing Plate	Cu / Mo / Custom
Surface Finish	Machined / Ground / Sputter-Ready
Packaging	Protective / Vacuum / Custom

• Aluminum Silicon Sputtering Target
• Al-Si Sputtering Target
• AlSi Sputtering Target
• Al/Si Sputtering Target
• Aluminum-Silicon Alloy Target
• Aluminum Silicon Metal Target
• High-Purity AlSi Target
• 99.9% AlSi Sputtering Target
• 99.99% AlSi Sputtering Target
• Al-0.5Si Sputtering Target
• Al-1Si Sputtering Target
• Al-2Si Sputtering Target
• Al-5Si Sputtering Target
• Al-10Si Sputtering Target
• Al-12Si Sputtering Target
• Al-20Si Sputtering Target
• Custom Al-Si Composition
• Semiconductor-Grade AlSi Target
• Microelectronics-Grade AlSi Target
• Metallization-Grade Aluminum Silicon Target
• Photovoltaic-Grade AlSi Target
• PVD-Grade AlSi Target
• DC Sputtering Grade
• RF Sputtering Grade
• Magnetron Sputtering Grade
• Reactive Sputtering Grade
• High-Density AlSi Target
• Bonded AlSi Sputtering Target
• Unbonded AlSi Sputtering Target
• Custom Aluminum Silicon Sputtering Target

1. What is an Aluminum Silicon Sputtering Target?

An Aluminum Silicon (Al/Si) Sputtering Target is a metallic alloy target consisting primarily of aluminum with a controlled amount of silicon. It is used as a source material for depositing Al-Si thin films through PVD and sputtering processes.

2. What are AlSi sputtering targets used for?

AlSi targets are used for semiconductor metallization, microelectronics, photovoltaics, MEMS, display technologies, optical coatings, thin-film electronics, and advanced PVD applications.

3. What silicon concentrations are available?

REG Metals can source a wide range of compositions, including common grades such as 0.5%, 1%, 2%, 5%, 10%, 12%, and 20% Si, with custom compositions available.

4. Can Al-Si targets be used for DC magnetron sputtering?

Yes. Aluminum-silicon is electrically conductive and is commonly compatible with DC and magnetron sputtering systems, subject to the requirements of the specific deposition equipment.

5. Can Aluminum Silicon targets be bonded?

Yes. Bonded AlSi sputtering targets can be supplied with compatible copper, molybdenum, or other backing plates. Unbonded targets can also be supplied.

6. Does REG Metals provide a Certificate of Analysis?

Yes. A Certificate of Analysis (COA) can be supplied documenting Al/Si composition, purity, trace impurities, density, dimensions, grain structure, and applicable sputtering-target specifications.