Lithium Tantalate Sputtering Target (LiTaO₃)

• Ferroelectric Properties: Suitable for functional oxide thin-film research and electronic devices.

• Piezoelectric Performance: Used in acoustic wave devices, resonators, and frequency-control components.

• Electro-Optic Properties: Supports optical modulation and photonics applications.

• Nonlinear Optical Behavior: Relevant to specialized optical and photonic research.

• Thin-Film Deposition: Designed for compatible sputtering systems and process configurations.

• Custom Specifications: Target dimensions, purity, bonding, and backing-plate requirements may be specified.

• Advanced Materials Compatibility: Used in semiconductor, sensor, telecommunications, and functional ceramic research.

Property	Typical Information
Product Name	Lithium Tantalate Sputtering Target
Chemical Name	Lithium Tantalate
Chemical Formula	LiTaO₃
CAS Number	12031-66-2
Molecular Weight	235.89 g/mol
Appearance	White or colorless crystalline solid
Crystal Structure	Trigonal
Density	Approximately 7.45 g/cm³
Melting Point	Approximately 1,650°C; decomposition behavior may depend on conditions
Purity	Typically 99.9%–99.99%, subject to availability
Material Type	Ferroelectric oxide ceramic
Key Properties	Piezoelectric, pyroelectric, electro-optic
Deposition Method	RF magnetron sputtering or other compatible PVD processes
Target Shape	Circular, rectangular, square, or custom
Bonding	Bonded or unbonded, subject to availability
Applications	SAW devices, photonics, sensors, semiconductor research

• 99.9% Lithium Tantalate Target: For general thin-film deposition and materials research.

• 99.99% High-Purity Lithium Tantalate Target: For applications requiring tighter impurity control.

• Research-Grade LiTaO₃ Target: For university, laboratory, and experimental deposition systems.

• Custom Lithium Tantalate Target: Dimensions, thickness, backing plates, and bonding options specified to match the deposition equipment.

1. What is a lithium tantalate sputtering target?

A lithium tantalate sputtering target is a solid LiTaO₃ ceramic material used in physical vapor deposition to create lithium tantalate thin films on substrates.

2. What is the chemical formula of lithium tantalate?

The chemical formula is LiTaO₃, consisting of lithium, tantalum, and oxygen.

3. What are lithium tantalate sputtering targets used for?

They are used in surface acoustic wave devices, piezoelectric thin films, optical and photonic components, sensors, telecommunications, and advanced electronic materials research.

4. Which sputtering method is used for lithium tantalate targets?

RF magnetron sputtering is a common option for insulating oxide targets. The appropriate process depends on target properties, deposition equipment, and desired film composition.

5. Are high-purity lithium tantalate sputtering targets available?

High-purity grades may be available, including 99.9% and 99.99% options. Confirm the exact purity basis, impurity limits, and certificate requirements when requesting a quotation.

6. Can lithium tantalate sputtering targets be custom-made?

Custom dimensions, thicknesses, target geometries, and bonding configurations may be sourced according to equipment requirements and supplier capabilities.