Magnesium Oxide Sputtering Target

• High-purity magnesium oxide ceramic

• Excellent thermal stability

• High electrical resistivity

• Suitable for RF magnetron sputtering

• Supports deposition of MgO functional thin films

• Available in multiple target geometries and dimensions

• High-density target options may be available

• Copper backing plate bonding may be available

• Custom specifications for research and industrial deposition systems

• COA and material documentation available as applicable

Property	Typical Information
Product Name	Magnesium Oxide Sputtering Target
Chemical Formula	MgO
CAS Number	1309-48-4
Molecular Weight	40.30 g/mol
Appearance	White ceramic
Crystal Structure	Cubic
Density	Approximately 3.58 g/cm³ theoretical
Melting Point	Approximately 2,852°C
Typical Purity	99.9%–99.99%+
Target Density	Grade-dependent; may approach theoretical density
Electrical Properties	Insulating ceramic
Sputtering Method	RF magnetron sputtering commonly used
Target Shapes	Circular, rectangular, square, custom
Surface Finish	Sputtering-grade machined surface
Bonding Options	Unbonded or bonded to a backing plate, subject to availability
Applications	PVD, semiconductor research, functional oxide thin films

• 99.9% Magnesium Oxide Sputtering Target

• 99.95% High-Purity MgO Sputtering Target

• 99.99% Ultra-High-Purity MgO Target

• RF Sputtering-Grade MgO Target

• High-Density MgO Ceramic Target

• Circular Magnesium Oxide Sputtering Target

• Rectangular Magnesium Oxide Sputtering Target

• Bonded MgO Sputtering Target

• Custom-Dimension MgO Sputtering Target

1. What is a magnesium oxide sputtering target?

A magnesium oxide sputtering target is a ceramic MgO component used in PVD equipment to deposit thin films onto substrates.

2. What is an MgO sputtering target used for?

MgO targets are used in semiconductor research, magnetic tunnel junctions, functional oxide films, electronic materials, and specialized thin-film applications.

3. Can MgO be used for RF magnetron sputtering?

Yes. Because MgO is electrically insulating, RF magnetron sputtering is commonly used. The suitable process depends on the deposition system, target geometry, and desired film properties.

4. What purity levels are available?

Potential grades include 99.9%, 99.95%, and 99.99% purity. Buyers should confirm the impurity limits and analytical specifications required for their deposition process.

5. Are bonded MgO sputtering targets available?

Bonded targets may be available with a suitable backing plate, commonly copper. Bonding method, thermal contact, dimensions, and compatibility with the sputtering system should be specified.

6. Can REG Metals source custom MgO sputtering targets?

REG Metals can source MgO sputtering targets subject to availability. Customers should specify purity, target dimensions, thickness, density, bonding configuration, and quantity when requesting a quotation.