Sodium Fluoride (NaF) Sputtering Target

• High-purity Sodium Fluoride (NaF) Sputtering Target
• NaF Sputtering Target
• Sodium Fluoride PVD Target
• High-purity inorganic fluoride material
• Controlled sodium and fluorine composition
• Excellent source material for fluoride thin films
• Suitable for RF sputtering
• Suitable for PVD thin-film deposition
• Suitable for optical coating research
• Suitable for infrared optical materials
• Suitable for semiconductor research
• Suitable for electronic materials
• Suitable for dielectric and insulating films
• Suitable for sensor research
• High chemical purity
• Low trace-metal impurities
• Dense target construction available
• Bonded and unbonded configurations available
• Custom target dimensions available
• Custom thickness available
• Custom purity available
• COA available

Property	Specification
Product Name	Sodium Fluoride Sputtering Target
Chemical Name	Sodium Fluoride
Chemical Formula	NaF
CAS Number	7681-49-4
Molecular Weight	41.99 g/mol
Sodium Content	~54.8 wt.%
Fluorine Content	~45.2 wt.%
Purity	99.9%, 99.99%, 99.999%, Custom
Appearance	White / Off-White Solid
Crystal Structure	Cubic
Density	~2.56 g/cm³
Melting Point	~993°C
Sputtering Method	RF / PVD / Custom
Target Shape	Circular / Rectangular / Custom
Diameter	Custom
Length	Custom
Width	Custom
Thickness	Custom
Bonding	Unbonded / Backing Plate Bonded
Backing Plate	Cu / Mo / Custom
Surface Finish	Sputter-Ready / Custom
Packaging	Protective / Vacuum / Custom

• 99.9% Sodium Fluoride Sputtering Target
• 99.99% Sodium Fluoride Sputtering Target
• 99.999% High-Purity NaF Sputtering Target
• High-Purity NaF Target
• Sodium Fluoride PVD Target
• Sodium Fluoride RF Sputtering Target
• Sodium Fluoride Thin-Film Target
• Optical-Grade NaF Sputtering Target
• Infrared-Grade Sodium Fluoride Target
• Semiconductor-Grade NaF Target
• Electronics-Grade Sodium Fluoride Target
• Research-Grade NaF Target
• Laboratory-Grade Sodium Fluoride Target
• Dense NaF Sputtering Target
• Bonded NaF Sputtering Target
• Unbonded NaF Sputtering Target
• Custom Sodium Fluoride Sputtering Target

1. What is a Sodium Fluoride (NaF) Sputtering Target?

A Sodium Fluoride Sputtering Target is a solid NaF material used as the source material in a sputtering system to deposit sodium fluoride-containing thin films and fluoride-based coatings.

2. What is Sodium Fluoride Sputtering Target used for?

NaF targets can be used for thin-film deposition, optical coatings, infrared materials research, semiconductor research, electronic materials, dielectric films, sensors, and advanced materials development.

3. Can NaF Sputtering Targets be used for RF sputtering?

Yes. RF sputtering is generally suitable for electrically insulating or poorly conducting target materials such as sodium fluoride.

4. What purity levels are available?

REG Metals can source 99.9%, 99.99%, and 99.999% Sodium Fluoride sputtering targets, with customized trace-metal impurity specifications available.

5. What target shapes are available?

Common configurations include circular and rectangular NaF sputtering targets, with custom geometries available according to the sputtering equipment.

6. Can NaF Targets be bonded to a backing plate?

Yes. Bonded Sodium Fluoride sputtering targets can be supplied with compatible backing plates such as copper or molybdenum, depending on the target design and cooling requirements.